For citations:

Nelyubin I.V., Volokhovsky A.D., Putrya M.G. Оptical scatterometry application for in-line control of geometric parameters of photoresist masks. Title in english. 2023;(1(130)):80-87. (In Russ.) https://doi.org/10.34680/2076-8052.2023.1(130).80-87