For citations:

Zhelannov A.V., Seleznev B.I., Fedorov D.G. Plasma etching of GaN/AlGaN structures in a chlorine-containing medium Cl₂/Ar/O₂. Title in english. 2021;(2(123)):21-26. (In Russ.) https://doi.org/10.34680/2076-8052.2021.2(123).21-26